EVG Nanoimprint Lithography Technology
A 6″ full area nanoimprinted wafer, processed by EVG NIL solutions
EVG’s SmartNIL technology stands out the company in the UV nanoimprint lithography market. In conjunction with a multi-use softstamp technology, SmartNIL provides unprecedented throughput, while maintaining maintenance-friendly operation and scalability with cost of ownership advantages. The innovative technology realizes a low-cost and high- volume nanoimprint lithography technique for mass production of LEDs, photonics, optics, advanced data storage, as well as biotechnology devices such as microfluidics.
Technical Specifications of SmartNIL™ Imprint Technology:
Parameter | SmartNIL™ |
---|---|
Resolution | 40nm in HVM; down to sub 15nm in R&D |
Throughput | > 60 units per hour |
Light Source | Broadband exposure |
Automated Separation | Integrated |
Inert Gas Printing | Integrated |
Multi-use Polymer Stamps | > 100 imprints/ stamp |
Stamp Fabrication | Integrated |
Open Material Platform | Open for all commercially available imprint materials |
Alignment | Optional top side alignment |
Key Features of SmartNIL™ Imprint Technology
SmartNIL technology in first print mode delivers a throughput of > 60 units/hour, making it the fastest full substrate soft UV-NIL solution in the world. The following are the key features of SmartNIL™ Imprint Technology:
- Imprint over topographies
- Top side alignment
- Optical clearance with no visible vacuum lines in active imprint area
Key Features of SmartNIL™ Stamp Technology
- Helps achieving the lowest cumulated processing costs
- Addresses cost and service life of incoming master stamp, a key characteristic in nanoimprint lithography
- Long range structure distortion and thermal mismatch can be avoided, thanks to room temperature and integrated stamp fabrication
- Low surface adhesion material facilitates isolation of substrate and stamp, while reducing friction
- Self cleaning properties of flexible stamp enable less particle sensitive imprint process with better overall processing yield
- Fabrication of SmartNIL stamps takes only minutes when compared to a PDMS casting process that takes 24 hours
Figure 1. Top image: SmartNIL™ replicated 150 mm substrate with 400nm dots. Left image: SEM close up of 400nm replicated dots.
Source: http://www.azonano.com/
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