A 6″ full area nanoimprinted wafer, processed by EVG NIL solutions

EVG’s SmartNIL technology stands out the company in the UV nanoimprint lithography market. In conjunction with a multi-use softstamp technology, SmartNIL provides unprecedented throughput, while maintaining maintenance-friendly operation and scalability with cost of ownership advantages.  The innovative technology realizes a low-cost and high- volume nanoimprint lithography technique for mass production of LEDs, photonics, optics, advanced data storage, as well as biotechnology devices such as microfluidics.

Technical Specifications of SmartNIL™ Imprint Technology: 

Parameter	SmartNIL™
Resolution	40nm in HVM; down to sub 15nm in R&D
Throughput	> 60 units per hour
Light Source	Broadband exposure
Automated Separation	Integrated
Inert Gas Printing	Integrated
Multi-use Polymer Stamps	> 100 imprints/ stamp
Stamp Fabrication	Integrated
Open Material Platform	Open for all commercially available imprint materials
Alignment	Optional top side alignment

Key Features of SmartNIL™ Imprint Technology

SmartNIL technology in first print mode delivers a throughput of > 60 units/hour, making it the fastest full substrate soft UV-NIL solution in the world. The following are the key features of SmartNIL™ Imprint Technology:

• Imprint over topographies
• Top side alignment
• Optical clearance with no visible vacuum lines in active imprint area

Key Features of SmartNIL™ Stamp Technology

• Helps achieving the lowest cumulated processing costs
• Addresses cost and service life of incoming master stamp, a key characteristic in nanoimprint lithography
• Long range structure distortion and thermal mismatch can be avoided, thanks to room temperature and integrated stamp fabrication
• Low surface adhesion material facilitates isolation of substrate and stamp, while reducing friction
• Self cleaning properties of flexible stamp enable less particle sensitive imprint process with better overall processing yield
• Fabrication of SmartNIL stamps takes only minutes when compared to a PDMS casting process that takes 24 hours

Figure 1. Top image: SmartNIL™ replicated 150 mm substrate with 400nm dots. Left image: SEM close up of 400nm replicated dots.

 Source: http://www.azonano.com/